Resistance evaporation source for filament or boat evaporation. A built-in shield prevents unwanted coating of the vacuum chamber and adjacent deposition accessories. |
AUTO 306 RESISTANCE EVAPORATION
SYSTEMS FOR RESEARCH AND
DEVELOPMENT
Resistance evaporation
Resistance evaporation is often be the most simple and cost-effective deposition technique. In this technique, most commonly used metals (such as aluminum, chromium, silver, gold and many others) are readily evaporated. BOC Edwards Auto 306 resistance evaporation systems provide researchers with an affordable but capable tool that can be upgraded as required by adding more sophisticated deposition techniques.
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AUTO 500 MULTI-PURPOSE DEPOSITION SYSTEM
• Large box chamber (500 mm diameter x 500 mm high).
• Front loading for easy access into the chamber
• Extra feedthrough holes built into the side wall for extra process monitoring and Residual Gas Analyzers
• Standard Diffusion, Turbo, Cryo pumping options
• Rack panel provides space for all thin film accessories and power supplies
• Available with a full range of accessories for thermal resistance, electron beam and r.f./d.c. Sputtering
The Auto 500 box chamber system is a versatile front loading thin film system
for research & development or pre-production. The chamber easily takes large diameter substrates and allows a combination of evaporation, electron beam and sputtering applications to be performed without breaking vacuum.
The FL 500 chamber is mounted on a pedestal, housing the pumping stack and is suitable for through wall or glovebox installations.
A rack panel next to the vacuum pedestal houses controls for vacuum and all thin film processes accessories.
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The 'intelligent' high vacuum valve opening sequence ensures a gradual
equalization of the different vacuum pressures in the chamber and below
the valve during the pump down cycle.
Processes
Thermal resistance evaporation
Electron beam
D.c. sputtering
R.f. sputtering
D.c. & r.f. sputtering
Resistive, EB, d.c., r.f. sputtering combination Glow discharge cleaning Substrate heating/cooling/r.f. biasing/rotation Film thickness monitoring and/or process control
Systems are designed and customized from a range of deposition sources, chamber sizes and 19 inch rack cabinets to suit individual requirements.
APPLICATIONS
Anti-reflective coatings
Semiconductors
Mirrors
Compact disc master metallization
Dielectrics
Organics/polymers
Photonics research
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AUTO 500 SPUTTERING SYSTEMS FOR
RESEARCH AND DEVELOPMENT
The Auto 500 can be configured as a powerful and versatile research sputtering system. Available options include:
• Up to 3 magnetron sputtering sources for upwards sputtering
• Gimballed sputtering sources for focused co-sputtering
• Wide choice of vacuum chambers
• R.f. and d.c. magnetron sputtering
• R.f. and d.c. co-sputtering
• R.f. and d.c. sputter etching
• Combined r.f., d.c., resistance and EB systems
• R.f. bias sputtering during deposition
• R.f. & d.c. power selector switches
• Reactive sputtering
• Loadlock ports and sample manipulation
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• Water-cooled and r.f. insulated workholders
• Automatic mass flow gas control for 1 or 3 process gases
• Automatic process control
• Substrate heating
Magnetron sputtering systems can be used to deposit virtually all metals, alloys and compounds. Most materials that would normally dissociate during thermal evaporation can be sputtered with constant composition. In addition, magnetron sputtering provides the researcher with a number of significant advantages over other deposition techniques. |
EB3 electron beam source with 4 cm3 crucibles fitted in an FL400 front-loading vacuum chamber. The electron beam source is positioned to give maximum film thickness uniformity onto rotating substrates.
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AUTO 500 ELECTRON BEAM SYSTEM FOR
RESEARCH AND DEVELOPMENT
Electron beam evaporation
BOC Edwards Auto 500 electron beam evaporation systems can deposit ultra pure films of materials with high melting points, and other materials that are difficult to deposit by resistance evaporation.
Very fast deposition rates can be achieved using electron beam evaporation. Electron beam sources can hold more evaporant than resistance sources which allows the deposition of thick films and multiple coatings before the need to refill the electron beam source.
Multi-process capability
BOC Edwards has designed a range of compact electron beam sources with all of the features normally found in large, expensive industrial coating systems.
Because of their compact size, the compact electron beam sources can be can be installed in the Auto 500 together with a wide |
range of other thin film process accessories. Some of the other accessories that can be installed in the Auto 500 with electron beam evaporation include those for resistance evaporation, magnetron sputtering, glow discharge cleaning and substrate heating.
Excellent deposition control
The high degree of control possible with electron beam sources enables materials to be evaporated with constant deposition rate control.
The Auto 500 can be supplied with quartz crystal deposition controllers that can be linked to the vacuum controller to provide fully automatic electron beam process control.
To provide maximum research flexibility, BOC Edwards electron beam systems have comprehensive manual controls for the electron beam source, X-Y beam sweep and turret indexing. |
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SYSTEMS FOR ELECTRON MICROSCOPE
SPECIMEN PREPARATION
BOC Edwards manufacture a comprehensive range of systems designed to provide the modern electron microscopist with all of the vacuum techniques routinely used to prepare specimens for imaging.
Our capability is the direct result of combining our vacuum and coating expertise with close collaboration with EM users and manufacturers.
Auto 306 high vacuum coating system
• Deposition of support films
• Carbon coatings for microanalysis
• Carbon replicas |
• Static shadow coating
• Rotary shadow coating
• Aperture cleaning
• Hydrophilic carbon films for negative staining
• Conductive coatings for SEM
Scancoat Six bench-top sputter coater
• Cool sputter coatings for SEM
• Carbon coatings for microanalysis
• Optical interference microscopy
PD3 plate degasser
Use the PD3 plate degasser to degas photographic films and plates. |
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AUTO 306 HIGH VACUUM SYSTEM FOR
EM SPECIMEN PREPARATION
• Choice of clean, fast vacuum pumping systems for the highest resolution
• PLC based automatic vacuum system for easy operation
• Wide range of modular specimen preparation accessories
• Comprehensive safety features and fully compliant with European Union
legislation
• Compact and modern design, quiet and vibration free
The Auto 306 provides the electron microscopist with a high quality vacuum system capable of performing a wide range of different preparation techniques in a single vacuum chamber. |
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