EB3 3 kW power supply with gun controls, X-Y sweep controller and turret indexer controls mounted in the 19 inch rack adaptor.
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ELECTRON BEAM SOURCES
Certain materials (for example titanium, nickel, cobalt, semi-refractory metal oxides and rare earth oxides) are difficult to evaporate with resistance heated sources, but can be readily deposited when heated by electron bombardment.
Electron beam sources provide economical and efficient usage of evaporant, enable easy changeover between evaporants and achieve high deposition rates. The high degree of control possible with electron beam sources enables constant rate deposition.
BOC Edwards manufactures a range of compact electron beam sources for the thin film researcher. All are supplied in modular form with all the parts to enable easy installation into BOC Edwards coating systems. |
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FILM THICKNESS MONITORS
BOC Edwards manufacture a range of quartz crystal film thickness monitors with a range of features to suit different customer applications and budgets.
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EB1 MAGNETICALLY FOCUSED
ELECTRON BEAM SOURCE
An ultra-compact electron beam source supplied mounted on an integral dual water feedthrough. The 1 cm3 copper hearth enables high rate, thick film depositions. Multiple sources can be fitted for multi-layer depositions.
The standard hearth is a water-cooled copper block with a conically shaped aperture to accept a removable copper crucible. Refractory crucible liners can be fitted for evaporating such materials as aluminum and copper.
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The power rating of the EB1 source is variable up to 3.0 kVA. Beam deflection of 180° is achieved by a permanent magnet manufactured from
Trigonal G, specially selected for its low outgassing characteristics and field stability at high temperatures.
The EB1 source is powered by the EB3 5 kV 600 mA constant voltage power supply.
The source is supplied complete with two high vacuum feedthroughs and an installation kit.
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EB3 MULTI HEARTH ELECTRON BEAM SOURCE
Multi hearth source
The EB3 series of sources provides all the features normally only found in much larger production systems in a compact size. The small footprint of the EB3 maximizes space in the vacuum chamber for other process hardware and also enables the source to be positioned where required for optimum coating uniformity. |
Features & benefits
• Four 4 cm3 crucibles, with 30 cm3 hopper and flat disc crucible option s
• 270° electron beam deflection minimizes filament contamination and prolongs filament life
• Removable water-cooled crucibles for easy cleaning and economical replacement
• 'Plug-in' emitter assembly for convenient filament maintenance
• Integral X-Y beam sweep coils enable optimum beam control during evaporation
• Inactive crucibles shielded to prevent cross-contamination of evaporation materials |
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FTM6 DIGITAL FILM THICKNESS MONITOR
Features & benefits
• Easy to read LED display of film thickness
• Memory storage for 2 deposition materials
• Automatic shutter control for reproducible film thickness termination
• Compact, space saving design
The FTM6 is an inexpensive film thickness monitor with high resolution and advanced features including shutter control for precise film thickness termination.
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The compact size of the FTM6 makes it particularly suitable for use with small coating systems.
The FTM6 can be used as a free-standing instrument or mounted into control consoles using the panel mounting kit supplied.
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FTM7 DIGITAL FILM THICKNESS
MONITOR
Features & benefits
• Easy to read LED display of film thickness and deposition rate
• Memory storage for 11 deposition materials
• Dual crystal holder/dual shutter control facility
• Tooling factor and acoustic impedance error correction
• Auto-sequence mode for simplified multi-layer deposition
• RS232 interface
The FTM7 is a sophisticated, fully featured instrument for monitoring film thickness and deposition rate.
feature is the auto-sequence mode which simplifies multi-layer deposition by automatically selecting the next deposition material each time the Run button is selected.
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The RS232 interface allows the FTM7 to be programed by an external computer and can also output data during the deposition process.
Up to 2 quartz crystal sensors can be connected to the FTM7, enabling two deposition sources to be sequentially monitored by separate sensors.
Built-in relays can be used to control up to two separate source shutters allowing deposition from two sources to be precisely terminated. A unique feature is the auto sequence mode which simplifies multi-layer deposition by automatically selecting the next deposition material each time the Run button is selected.
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UNIVERSAL CRYSTAL HOLDER
The BOC Edwards crystal holder is suitable for most deposition processes and it operates effectively in an r.f. sputtering environment.
Good thermal stability is achieved by water cooling the crystal holder, which can also be baked up to 200 ºC. The flexible water lines can be extended to allow easy positioning of the crystal head.
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The snap-in crystal enclosure makes crystal changing easy and quick.
The crystal holder has a standard NW25 leadthrough, and is ready for immediate installation without soldering, brazing or separate water connections. |
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EPM75 AND EPM100 PLANAR
MAGNETRON SPUTTERING SOURCES
• Easy to install
• Integral NW25 leadthrough
• R.f. or d.c. operation
• Magnetron or diode sputtering
• Offset leadthrough enables variable radial positioning
BOC Edwards planar magnetron sputtering sources are easy to fit and position in any vacuum system that has suitable 25 mm or 1 inch diameter holes. |
The offset leadthrough design allows easy adjustment of the radial source position.
The EPM source design is well proven, having been used for many years in BOC Edwards sputtering systems.
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