SMALL PUMPS AND
PUMPING SYSTEMS
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INDUSTRIAL PUMPS AND PUMPING SYSTEMS
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CHEMICAL PUMPS AND PUMPING SYSTEMS
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SEMICONDUCTOR PUMPS
AND EXHAUST MANAGEMENT
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INLINE 250
The Inline 250 is a low-cost, point of use, dry abatement system for the semiconductor industry. High temperature treatment gives permanent gas destruction and removal of halogens, acids and other halide etch compounds.
The Inline 250 safely treats toxic organochloride by products and maximizes use of cartridges and minimizes cost of ownership.
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PDF con características
técnicas del producto.
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Tamaño: 9.49 MB |
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Features & benefits
• 250 mm cartridges increase cartridge capacity by 30%
• Optimized operation of the cartridges in series ensures maximum use of material
• Safest treatment by chemical reaction to stable inert salts
• Widest range of gases treated, from halogens and acids to ClF3, NF3, C4F8, SF6 and other halide etch compounds
• No desorption risks, unique to high temperature systems
• No toxic wastes
• 100% uptime with auto changeover
• Continuous abatement even in power failure
• Integral heated inlet piping (option)
• Low energy, low utility requirements |
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D150 DUAL GAS REACTOR COLUMN
The D150 is a dual canister GRC designed for automatic change-over from the primary cartridge to the back-up cartridge.
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PDF con características
técnicas del producto.
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Tamaño: 9.49 MB |
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M150 SINGLE GAS REACTOR COLUMN
The M150 Gas Reactor Column is a compact technology developed for the semiconductor industry. This revolutionary dry gas treatment system removes hazardous etch and CVD emissions at source, converting them into harmless solids within an easily changed and disposable cartridge.
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PDF con características
técnicas del producto.
Ver: Página 94
Tamaño: 9.49 MB |
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GANCAT
The GaNcat is an electrically heated cartridge-based solution for treating the high ammonia exhaust gas flows from GaN-based MOCVD processes. It incorporates the same generic features as the GRC on which it is based, and by combining multiple cartridges in parallel it is possible to treat even the highest process gas flows.
The unique cartridge design has two stages, the first to decompose the metalorganic vapors |
(such as TMG, TMI and TMA), which would otherwise ‘poison’ the second stage, where ammonia is decomposed into nitrogen and hydrogen. Because the chemistry is primarily
catalytic in nature, the GaNcat is a cost-effective solution for this application and does not generate NOx or waste-water. An optional backup cartridge allows for cartridge swap-out without having taken the GaNcat off-line, optimizing productive uptime.
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PDF con características
técnicas del producto.
Ver: Página 95
Tamaño: 9.49 MB |
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